Researchers at Moscow's Institute of Physics and Technology (MIPT) developed a method of depositing the functional layers of an RRAM memory cell using high quality ALD coating. The researchers report that ALD enables a controllable growth of oxygen deficient oxides.
The MIPT researchers used production-proven ALD equipment made by Picosun. The researchers now want to see whether the ALD process can be scaled to an industrial-scale production process.
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Posted: Jun 28,2017 by Ron Mertens